Uses in Chemical / Pharmaceutical Industries

Recommended Model

SLT Series

SLT Series

  • Ultimate Pressure: 1.3 ~ 0.7 Pa
  • Exhaust Speed: 1,100 ~ 3,000 L/min

Product Catalogue (PDF)

MDP Series

MDP Series

  • Ultimate Pressure: 100 ~ 0.7 Pa
  • Exhaust Speed: 1,100 ~ 35,000 L/min

Product Catalogue (PDF)

MDP-V Series

MDP-V Series

  • Ultimate Pressure: 2 ~ 0.5 Pa
  • Exhaust Speed: 5,500 ~ 22,000 L/min

Product Catalogue (PDF)

SDV-R Series

SDV-R Series

  • Ultimate Pressure: 10〜30Pa
  • Exhaust Speed: 850〜2800L/min

Product Catalogue (PDF)

Example of Use

Vacuum Drying The drying method under vacuum condition. Lower air pressure decreases the partial pressure of moisture in the air to lower the boiling point of moisture. This accelerates the evaporating speed of moisture to dry the objects earlier.
Vacuum Freeze Drying Vacuum freeze drying is a widely applied vacuum use. In this method, foods and chemicals, which are weak against heat, are frozen and the moisture in them is sublimated under vacuum condition. This achieves the long term storage of food and chemical, also objects can be back to the original conditions by providing some moisture.
Vacuum Distillation Vacuum distillation utilizes the phenomenon that boiling point lowers as pressure does. This method is used for separating / refining the substances that, for example, can be thermally decomposed or is difficult to distillate under ambient pressure.
Vacuum Defoaming Liquid such as liquid resin are stirred by, for example, vacuum stirrer and extruder under vacuum condition to prevent foams to be mixed with the liquid to provide high quality products.
Vacuum Sterilization Sterilization machine is used in vacuum condition. The media used by the machine include high-pressure vapor, plasma, and sonic wave.
Gas Recovery Vacuum pump is used in the machine that separates and distillates, under vacuum condition, VOC gas at the same time, also is used for recovering residual gas.
PSA Machine Pressure Swing Adsorption (PSA) machine, which uses the difference between the properties of the adsorption media to the handled gas, pressurizes and depressurizes the gas in a repeated way to continuously extract the target gas.
Si Crystal Pulling Furnace Vacuum pump is used for suction and exhaustion of the SiO gas formed by the argon gas introduced from the top of the furnace when silicon single crystal ingot is pulled from the furnace in Czochralski (CZ) method.

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